Tri-Layer Resist Fabrication Technology of T-Shaped Gate Using X-Ray Lithography
用三层胶工艺X射线光刻制作T型栅

The tri-layer resist technology is used to fabricate T-shaped gate.The fabrication efficiency is high.The shape of T-shaped gate is perfect.The ratio of head to footprint of the T-shaped gate is controllable.The way meets the need of the device fabrication.