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半导体学报 2005
Design and Fabrication of K-Band Double Bridge Capacitive MEMS Switches
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Abstract:
Design and fabrication of a novel K-band capacitive RF MEMS switch are reported.The switch consists of two suspended metallic membranes supported by a serpentine flexible spring over a coplanar waveguide.The design,which is realized with commercial EDA tools,is optimized based on a series of simulations.The simulations show that the proposed switch structure presents improved isolation in a relatively low RF frequency (K band).This switch is made using a silicon surface micromachining process.On wafer measurement is carried out.The threshold voltage is less than 19.5V,the insertion loss is 1.6dB@19.6GHz,and the isolation is 46.0dB@19.6GHz.