MWECR-CVD System with a New Magnetic Field and Deposition of a-Si∶H Films
一种新型磁场MWECR-CVD和氢化非晶硅薄膜制备

In order to simplify the MWECR CVD system using multiple electromagnetic coils,the new magnetic fields generated by assembling a electromagnetic coils and a permanent magnet unit are presented.With these magnetic fields,the plasma is converged above the sample holder and the permanent magnet unit,and the energy density of plasma is enhanced obviously.Comparing to MWECR CVD system using single or double electromagnetic coils,this new magnetic field MWECR CVD system can obtain higher deposition rates of a Si:H films,and its deposition rates are multiple to ten times of that with conventional RF PECVD systems.