%0 Journal Article
%T MWECR-CVD System with a New Magnetic Field and Deposition of a-Si∶H Films<br>一种新型磁场MWECR-CVD和氢化非晶硅薄膜制备
%A Yin Shengyi
%A Chen Guanghua
%A Wu Yueying
%A Wang Qing
%A Liu Yi
%A Zhang Wenli
%A Song Xuemei
%A Deng Jinxiang
%A <br>殷生毅
%A 陈光华
%A 吴越颖
%A 王青
%A 刘毅
%A 张文理
%A 宋雪梅
%A 邓金祥
%J 半导体学报
%D 2004
%I 
%X In order to simplify the MWECR CVD system using multiple electromagnetic coils,the new magnetic fields generated by assembling a electromagnetic coils and a permanent magnet unit are presented.With these magnetic fields,the plasma is converged above the sample holder and the permanent magnet unit,and the energy density of plasma is enhanced obviously.Comparing to MWECR CVD system using single or double electromagnetic coils,this new magnetic field MWECR CVD system can obtain higher deposition rates of a Si:H films,and its deposition rates are multiple to ten times of that with conventional RF PECVD systems.
%K ECR-CVD
%K 永磁体
%K 磁场
%K 氢化非晶硅
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=5EAD2B7234AD0EE2&yid=D0E58B75BFD8E51C&vid=C5154311167311FE&iid=94C357A881DFC066&sid=BB98BB04E861B6F5&eid=D45762219109E903&journal_id=1674-4926&journal_name=半导体学报&referenced_num=3&reference_num=5