Simulating Technique with Virtual Film Inserting for Photoresist Exposure
光致抗蚀剂曝光的虚膜插入模拟技术

Computing method with inserting zero-thickness film into arbitrary two films is proposed,and the corresponding optical film transmission matrixes are deduced.The method decouples the correlation between films,facilitates the storage in computers and the calculation of the reflectivity,transmittivity and energy flow density. The calculating result to photoresist exposure indicates the computing technique is feasible.