%0 Journal Article
%T Simulating Technique with Virtual Film Inserting for Photoresist Exposure<br>光致抗蚀剂曝光的虚膜插入模拟技术
%A Fan Jianxing
%A Yang Huazhong
%A Wang Hui
%A <br>范建兴
%A 杨华中
%A 汪蕙
%J 半导体学报
%D 2002
%I 
%X Computing method with inserting zero-thickness film into arbitrary two films is proposed,and the corresponding optical film transmission matrixes are deduced.The method decouples the correlation between films,facilitates the storage in computers and the calculation of the reflectivity,transmittivity and energy flow density. The calculating result to photoresist exposure indicates the computing technique is feasible.
%K optical transmission matrix
%K photoresist exposure
%K optical film calculating<br>光学传输矩阵
%K 抗蚀剂曝光
%K 光学薄膜计算
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=0E77EF3BBF5C437D&yid=C3ACC247184A22C1&vid=EA389574707BDED3&iid=5D311CA918CA9A03&sid=AE1A1B758F4F84BC&eid=412FA1328E0CB9E9&journal_id=1674-4926&journal_name=半导体学报&referenced_num=1&reference_num=8