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OALib Journal期刊
ISSN: 2333-9721
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A Phase-Compatibility Rule Checker for Standard Cell Layout Designed with Alternating PSM
一种用于标准单元版图交替移相掩模相位兼容性规则检查的工具

Keywords: alternating phase shifting mask,conflict graph,standard cell
交替移相掩模
,相位冲突图,标准单元

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Abstract:

Based on generation and processing of phase conflict graph,a new method is presented to fully and accurately verify the phase compatibility of dark field standard cell layouts,which are produced according to conventional design rules.A software implementing this method is presented as well,which has the capabilities of verifying standard cell layout,locating features with phase conflicts and giving out suggestions for modification.Experiment results show the effectiveness of this useful tool.

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