%0 Journal Article
%T A Phase-Compatibility Rule Checker for Standard Cell Layout Designed with Alternating PSM<br>一种用于标准单元版图交替移相掩模相位兼容性规则检查的工具
%A Gao Gensheng
%A Shi Zheng
%A Chen Ye
%A Yan Xiaolang
%A <br>高根生
%A 史峥
%A 陈晔
%A 严晓浪
%J 半导体学报
%D 2004
%I 
%X Based on generation and processing of phase conflict graph,a new method is presented to fully and accurately verify the phase compatibility of dark field standard cell layouts,which are produced according to conventional design rules.A software implementing this method is presented as well,which has the capabilities of verifying standard cell layout,locating features with phase conflicts and giving out suggestions for modification.Experiment results show the effectiveness of this useful tool.
%K alternating phase shifting mask
%K conflict graph
%K standard cell<br>交替移相掩模
%K 相位冲突图
%K 标准单元
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=10E324B7715EECFE&yid=D0E58B75BFD8E51C&vid=C5154311167311FE&iid=94C357A881DFC066&sid=ED9DF3402785F68D&eid=6EEC242D0D8BE428&journal_id=1674-4926&journal_name=半导体学报&referenced_num=3&reference_num=5