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半导体学报 1989
Study on Structure of Co-Mn-Ni Oxide Film Deposited by RF Sputtering
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Abstract:
Co-Mn-Ni oxide thin film deposited by RF sputtering on the substrates of single-crystal ai-licon, glass and Al_2O_3 is a good temperature sensitive material.It is indicated by the analysesof SEM, X-ray diffraction and Auger spectrumthat the atom ratio of the deposited films hassome deviation from the target material and the film structure is amophous or spinel.Basedon the results of X-ray diffraction,Raman spectrum and the Fourier-transforming infraredspectrum of the annealed samples, the condition of formation of amophous film and spinel filmis discussed.