%0 Journal Article
%T Study on Structure of Co-Mn-Ni Oxide Film Deposited by RF Sputtering<br>射频溅射CoMnNi氧化物薄膜结构研究
%A Tan Hui/Xinjiang Institute of Physics
%A Academia SinicaUrumqiTao Mingde/Xinjiang Institute of Physics
%A Academia SinicaUrumqiHan Ying/Xinjiang Institute of Physics
%A Academia SinicaUrumqiZhang Han/Xinjiang Institute of Physics
%A Academia SinicaUrumqi
%A <br>谭辉
%A 陶明德
%A 韩英
%A 张寒
%J 半导体学报
%D 1989
%I 
%X Co-Mn-Ni oxide thin film deposited by RF sputtering on the substrates of single-crystal ai-licon, glass and Al_2O_3 is a good temperature sensitive material.It is indicated by the analysesof SEM, X-ray diffraction and Auger spectrumthat the atom ratio of the deposited films hassome deviation from the target material and the film structure is amophous or spinel.Basedon the results of X-ray diffraction,Raman spectrum and the Fourier-transforming infraredspectrum of the annealed samples, the condition of formation of amophous film and spinel filmis discussed.
%K RF sputtering
%K Oxide film
%K Amorphous
%K Spinel<br>射频溅射
%K 氧化物
%K 薄膜
%K 结构
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=C004C96696D9282F&yid=1833A6AA51F779C1&vid=F3090AE9B60B7ED1&iid=DF92D298D3FF1E6E&sid=CEFA535D01173730&eid=51F9E747BA1ACB45&journal_id=1674-4926&journal_name=半导体学报&referenced_num=1&reference_num=5