OALib Journal期刊
ISSN: 2333-9721
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Plasma Etching a-Si:H/a-C: H Superlattice
等离子刻蚀a-Si:H/a-C:H超晶格

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Abstract:

A method of plasma etching a-Si:H/a-C:H superlatice using C_7F_(14)_O_2 is reported. It issimple and feasible.

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Plasma Etching a-Si:H/a-C: H Superlattice等离子刻蚀a-Si:H/a-C:H超晶格