%0 Journal Article
%T Plasma Etching a-Si:H/a-C: H Superlattice<br>等离子刻蚀a-Si:H/a-C:H超晶格
%A Wang Yuling/Microelectronics Center
%A Chinese Academy of Sciences BeijnigZhang Qing/Semiconductor Institute
%A Chinese Academy of Sciences
%A Beijing
%A <br>王玉玲
%A 张青
%J 半导体学报
%D 1988
%I 
%X A method of plasma etching a-Si:H/a-C:H superlatice using C_7F_(14)_O_2 is reported. It issimple and feasible.
%K a-Si:H/a-C:H
%K Superlattice
%K Plasma etching<br>a-Si:H/a-C:H
%K 超晶格
%K 等离子刻蚀
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=8DC0740B6FFB0F7A&yid=0702FE8EC3581E51&vid=9CF7A0430CBB2DFD&iid=38B194292C032A66&sid=86C0C9A759FDA8CA&eid=170CE8B011EA4FD9&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=0