Computer Simulation of Thin Film Growth and Interface Structure
薄膜生长及界面结构的计算机模拟

Some of the processes involved in thin film nucleation and growth are discussed.Somephenomena presented in homogeneous and heteroepitaxy growth are also investigated. Bymeans of computer simulation,the interface potential,the interface distort and the interfacedefect are specially emphasized.The surface morphology of vapor-deposited and LPE films isdemoastrated by computer simulation.The comparision and identify of this work with theexperimental results are also given.