Influence of Processing Parameters on the Deposition of a-CNx Films
工艺参数对a-CNx膜沉积的影响

The influence of basic processing parameters on the deposition of a-CNx was studied.The results show that the increase of N flux enhances the deposition rate of the film as well asincreases its N content. While higher sputtering power leads to higher deposition rate. Further-more, the employment of bias will prove to be beneficial in the preparation of CNx film in thatit not only facilitates the densification process and produces a smoother surface morphology, butalso increases the content of N in the film.