%0 Journal Article
%T Influence of Processing Parameters on the Deposition of a-CNx Films<br>工艺参数对a-CNx膜沉积的影响
%A XIAO Xing-Cheng
%A JIANG Wei-Hut
%A SONG Li-Xin
%A TIAN Jing-Fen
%A HU Xing-Fang
%A <br>肖兴成
%A 江伟辉
%A 宋力昕
%A 田静芬
%A 胡行方
%J 无机材料学报
%D 2000
%I Science Press
%X The influence of basic processing parameters on the deposition of a-CNx was studied.The results show that the increase of N flux enhances the deposition rate of the film as well asincreases its N content. While higher sputtering power leads to higher deposition rate. Further-more, the employment of bias will prove to be beneficial in the preparation of CNx film in thatit not only facilitates the densification process and produces a smoother surface morphology, butalso increases the content of N in the film.
%K a-CNx films
%K processing parameters
%K deposition<br>a－CNx膜
%K 工艺参数
%K 沉积
%K 薄膜
%K 磁控溅射
%K 氮化碳
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=0D5D593BCFB8E8E4&yid=9806D0D4EAA9BED3&vid=23CCDDCD68FFCC2F&iid=CA4FD0336C81A37A&sid=DD74772618543076&eid=3E0812ED84A7B31D&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=0&reference_num=12