Processing and Characterization of Graded B4 C/Cu Facing Plasma Composite
梯度复合B4C/Cu面向等离子体材料的制备与表征

Based on their distinct resistivity and melting point, a new approach for fabricating graded B4C/Cu composite by rapid self-resistance sintering under ultra-high pressure was proposed in this paper and with which a near dense plasma facing material with 0-100% compositional distributions of B4C was obtained on conditions of 12kW electric power input, 2-4GPa pressure applied, 40s duration and properly consecutive heat treatment. Well-graded composition and structure of that composite were demonstrated by SEM analysis. Tests on plasma relevant performances show that the chemical sputtering yield of B4C/Cu graded composite is 70% lower than that of SMF 800 nuclear graphite, and the surface of the composite is almost no damages after in-situ plasma irradiation in Tokamak apparatus.