%0 Journal Article
%T Processing and Characterization of Graded B4 C/Cu Facing Plasma Composite
梯度复合B4C/Cu面向等离子体材料的制备与表征
%A LING Yun-Han
%A LI Jiang-Tao
%A GE Chang-Chun
%A
凌云汉
%A 李江涛
%A 葛昌纯
%J 无机材料学报
%D 2001
%I Science Press
%X Based on their distinct resistivity and melting point, a new approach for fabricating graded B4C/Cu composite by rapid self-resistance sintering under ultra-high pressure was proposed in this paper and with which a near dense plasma facing material with 0-100% compositional distributions of B4C was obtained on conditions of 12kW electric power input, 2-4GPa pressure applied, 40s duration and properly consecutive heat treatment. Well-graded composition and structure of that composite were demonstrated by SEM analysis. Tests on plasma relevant performances show that the chemical sputtering yield of B4C/Cu graded composite is 70% lower than that of SMF 800 nuclear graphite, and the surface of the composite is almost no damages after in-situ plasma irradiation in Tokamak apparatus.
%K functionally graded material
%K composite
%K plasma facing material
%K boron carbide
%K copper
%K sintering
功能梯度材料
%K 复合材料
%K 面向等离子体材料
%K 碳化硼
%K 铜
%K 烧结
%K 制备
%K 表征
%K B4C/Cu
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=1C8A97841DF0DCEA&yid=14E7EF987E4155E6&vid=7801E6FC5AE9020C&iid=B31275AF3241DB2D&sid=F88EF6DD822B0FF5&eid=FB318F788ECEF1B2&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=1&reference_num=13