%0 Journal Article %T Processing and Characterization of Graded B4 C/Cu Facing Plasma Composite
梯度复合B4C/Cu面向等离子体材料的制备与表征 %A LING Yun-Han %A LI Jiang-Tao %A GE Chang-Chun %A
凌云汉 %A 李江涛 %A 葛昌纯 %J 无机材料学报 %D 2001 %I Science Press %X Based on their distinct resistivity and melting point, a new approach for fabricating graded B4C/Cu composite by rapid self-resistance sintering under ultra-high pressure was proposed in this paper and with which a near dense plasma facing material with 0-100% compositional distributions of B4C was obtained on conditions of 12kW electric power input, 2-4GPa pressure applied, 40s duration and properly consecutive heat treatment. Well-graded composition and structure of that composite were demonstrated by SEM analysis. Tests on plasma relevant performances show that the chemical sputtering yield of B4C/Cu graded composite is 70% lower than that of SMF 800 nuclear graphite, and the surface of the composite is almost no damages after in-situ plasma irradiation in Tokamak apparatus. %K functionally graded material %K composite %K plasma facing material %K boron carbide %K copper %K sintering
功能梯度材料 %K 复合材料 %K 面向等离子体材料 %K 碳化硼 %K 铜 %K 烧结 %K 制备 %K 表征 %K B4C/Cu %U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=1C8A97841DF0DCEA&yid=14E7EF987E4155E6&vid=7801E6FC5AE9020C&iid=B31275AF3241DB2D&sid=F88EF6DD822B0FF5&eid=FB318F788ECEF1B2&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=1&reference_num=13