Nucleation and Growth of CVD Diamond Films on Smooth SiSubstrate Pretreated by Nanodiamond Powders
纳米粉预处理的CVD金刚石薄膜成核与生长研究

Ultradispersed nanodiarnond powder synthesized by explosive detonation was used for thepretreatment of mirror Si substrate for nucleation and growth of diamond by microwave plasmaCVD. Compared with the scratching pretreatment, it is found that the pretreatment method bycoating substrate with the slurry loading nanodiamond powder not only enhances both of density(up to .109 cm-2) and nucleation rate, improving the quality of grown-up film greatly, but alsocontrols nucleation easily. In addition, this pretreatment is also very cost-effective, non-damaging,and reproducible as well.