%0 Journal Article %T Nucleation and Growth of CVD Diamond Films on Smooth SiSubstrate Pretreated by Nanodiamond Powders
纳米粉预处理的CVD金刚石薄膜成核与生长研究 %A SHAO Le-Xi %A XIE Er-Qing %A HE De-Yan %A CHEN Guang-Hua %A XU Kang %A
邵乐喜 %A 谢二庆 %A 贺德衍 %A 陈光华 %A 徐康 %J 无机材料学报 %D 1998 %I Science Press %X Ultradispersed nanodiarnond powder synthesized by explosive detonation was used for thepretreatment of mirror Si substrate for nucleation and growth of diamond by microwave plasmaCVD. Compared with the scratching pretreatment, it is found that the pretreatment method bycoating substrate with the slurry loading nanodiamond powder not only enhances both of density(up to .109 cm-2) and nucleation rate, improving the quality of grown-up film greatly, but alsocontrols nucleation easily. In addition, this pretreatment is also very cost-effective, non-damaging,and reproducible as well. %K CVD diamond %K nucleation %K pretreatment of substrate %K nanodiamond powder
CVD金刚石 %K 成核 %K 衬底预处理 %K 纳米金刚石粉 %U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=EB290F7852E805EDE0A03251EBCED623&yid=8CAA3A429E3EA654&vid=FC0714F8D2EB605D&iid=B31275AF3241DB2D&sid=2B25C5E62F83A049&eid=90EAFEE49150CFCD&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=5&reference_num=12