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OALib Journal期刊
ISSN: 2333-9721
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Sputtering Deposition and X-ray Photoelectron Spectroscopy Study for the ZnS Thin Film
ZnS薄膜的溅射沉积及其XPS研究

Keywords: ZnS,ion beam sputtering deposition technique,XPS,HgCdTe,surface anti-reflection coat
硫化锌薄膜
,离子束溅射沉积,XPS,HgCdTe

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Abstract:

The ZnS film was grown on HgCdTe surface by using the low-temperature ion beam sputtering technique. Zn and S elements in the sputtering ZnS film sample were studied and compared with those in the evaporating ZnS film by using X-ray photoelectron spectroscopy (XPS) technique. It is proved that the constituent elements are homogeneous, and the deposition of element Zn, S cannot be detected in the sputtering ZnS film.

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