%0 Journal Article
%T Sputtering Deposition and X-ray Photoelectron Spectroscopy Study for the ZnS Thin Film<br>ZnS薄膜的溅射沉积及其XPS研究
%A ZHOU Yong-dong
%A FANG Jia-xiong
%A LI Yan-Jin
%A GONG Hai-mei
%A TANG Ding-Yuan
%A <br>周咏东
%A 方家熊
%A 李言谨
%A 龚海梅
%A 汤定元
%J 无机材料学报
%D 2000
%I Science Press
%X The ZnS film was grown on HgCdTe surface by using the low-temperature ion beam sputtering technique. Zn and S elements in the sputtering ZnS film sample were studied and compared with those in the evaporating ZnS film by using X-ray photoelectron spectroscopy (XPS) technique. It is proved that the constituent elements are homogeneous, and the deposition of element Zn, S cannot be detected in the sputtering ZnS film.
%K ZnS
%K ion beam sputtering deposition technique
%K XPS
%K HgCdTe
%K surface anti-reflection coat<br>硫化锌薄膜
%K 离子束溅射沉积
%K XPS
%K HgCdTe
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=ABC0063016AF57E1C73EF43C8D2212BD&aid=CAB9C3DD3CC60F67&yid=9806D0D4EAA9BED3&vid=23CCDDCD68FFCC2F&iid=B31275AF3241DB2D&sid=FB318F788ECEF1B2&eid=005F3549A8D9454D&journal_id=1000-324X&journal_name=无机材料学报&referenced_num=7&reference_num=11