Study of microcrystalline silicon solar cells fabricated by very high frequency plasma-enhanced chemical vapor deposition
甚高频等离子体增强化学气相沉积制备微晶硅太阳电池的研究

Microcrystalline silicon solar cells with the variation of silane concentration (SC) and discharge power were fabricated by very high frequency plasma_enhanced chemical vapor deposition. The results of J_V measurements showed that open circuit voltage (Vococ) of solar cells decreases with the decr ease of silane concentration and the increase of power in the range of experiments. I nfluence of SC on short_circuit current density (Jscsc) is more evi dent than power. As for microcrystalline silicon solar cells, the optimum choice for N layer is amorphous, because it can decrease the lateral collection effect of current on the one hand and increase the fill factor on the other hand.