%0 Journal Article
%T Study of microcrystalline silicon solar cells fabricated by very high frequency plasma-enhanced chemical vapor deposition<br>甚高频等离子体增强化学气相沉积制备微晶硅太阳电池的研究
%A Zhang Xiao-Dan
%A Zhao Ying
%A GAO Yan-tao
%A Zhu Feng
%A WEI Chang-chun
%A Sun Jian
%A Wang Yan
%A Ceng Xin-Hua
%A XIONG Shao-zhen
%A <br>张晓丹
%A 赵颖
%A 高艳涛
%A 朱锋
%A 魏长春
%A 孙建
%A 王岩
%A 耿新华
%A 熊绍珍
%J 物理学报
%D 2005
%I 
%X Microcrystalline silicon solar cells with the variation of silane concentration (SC) and discharge power were fabricated by very high frequency plasma_enhanced chemical vapor deposition. The results of J_V measurements showed that open circuit voltage (Vococ) of solar cells decreases with the decr ease of silane concentration and the increase of power in the range of experiments. I nfluence of SC on short_circuit current density (Jscsc) is more evi dent than power. As for microcrystalline silicon solar cells, the optimum choice for N layer is amorphous, because it can decrease the lateral collection effect of current on the one hand and increase the fill factor on the other hand.
%K microcrystalline silicon solar cells
%K very high frequency plasma_enhanced chemical vapor deposition<br>微晶硅太阳电池，甚高频等离子体增强化学气相沉积
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=BEF7713D193DE43E&yid=2DD7160C83D0ACED&vid=318E4CC20AED4940&iid=E158A972A605785F&sid=5349C9BD3C454FC9&eid=BE1B94DF77D86B4A&journal_id=1000-3290&journal_name=物理学报&referenced_num=5&reference_num=10