Fabrication and properties of nano metric tunneling junction
纳米隧道结的制备和特性研究

Applicable nano metric titanium-titanium oxide line-titanium tunneling junction was fabricated with dual-facing target sputtering,micro-electronic optical lithography and atomic force microscope anodic oxidation.The thickness of titanium film of the fabricated junction was 3nm and the width of the titanium oxide line was 60.5nm.The I-V curve of the tunneling junction at room temperature clearly indicates the Coulomb blockade effect.