%0 Journal Article
%T Fabrication and properties of nano metric tunneling junction<br>纳米隧道结的制备和特性研究
%A Kuang Deng-Feng
%A Liu Qing-Gang
%A Hu Xiao-Tang
%A Hu Liu-Chang
%A Guo Wei-Lian
%A <br>匡登峰
%A 刘庆纲
%A 胡小唐
%A 胡留长
%A 郭维廉
%J 物理学报
%D 2006
%I 
%X Applicable nano metric titanium-titanium oxide line-titanium tunneling junction was fabricated with dual-facing target sputtering,micro-electronic optical lithography and atomic force microscope anodic oxidation.The thickness of titanium film of the fabricated junction was 3nm and the width of the titanium oxide line was 60.5nm.The I-V curve of the tunneling junction at room temperature clearly indicates the Coulomb blockade effect.
%K atomic force microscope anodic oxidation
%K titanium oxide line
%K tunneling junction
%K Coulomb blockade effect<br>原子力显微镜阳极氧化
%K 钛氧化线
%K 隧道结
%K 库仑阻塞效应
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6e709dc38fa1d09a4b578dd0906875b5b44d4d294832bb8e&cid=47ea7cfddebb28e0&jid=29df2cb55ef687e7efa80dfd4b978260&aid=604a13921c200891&yid=37904dc365dd7266&vid=e514ee58e0e50ecf&iid=ca4fd0336c81a37a&sid=e203fb1a272c9dd2&eid=06ea2770e96c5402&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=14