The model of the magnetic mirror effect in the unbalanced magnetron sputtering ion beams
非平衡磁控溅射系统离子束流磁镜效应模型

A conventional magnetron and a co axial electro solenoid were used to construct an unbalanced magnetron sputtering deposition system for investigating its properties. At 0 2Pa, argon gas discharging, a shielded planar ion collecting electrode was taken to measure the saturation ion beam flux density at the different axial positions. The saturation ion flux reached about 9mA/cm 2. The magneto hydrodynamics was applied to analyse the influences of the magnetic mirror effect on the discharge properties caused by the solenoid. As a result, the comparisons of the theoretical calculations with the experiments indicated that the model described correctly the plasma properties in the unbalanced magnetron sputtering system.