INVESTIGATIONS OF TiO2 FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING
反应溅射法制备TiO2薄膜

TiO2 thin films were prepared by reactive magnetron sputtering.The influences of O2 partial pressure,substrate temperature and annealing temperature on the structural properties of the films have been studied.In these films anatase and rutile phases were observed and their respective preferred crystallizing conditions were analyzed.In this paper,the morphological characteristic of TiO2 film was also discussed.