%0 Journal Article
%T INVESTIGATIONS OF TiO2 FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING<br>反应溅射法制备TiO2薄膜
%A ZHAO KUN
%A ZHU FENG
%A WANG LI-FANG
%A MENG TIE-JUN
%A ZHANG BAO-CHENG
%A ZHAO KUI
%A <br>赵坤
%A 朱凤
%A 王莉芳
%A 孟铁军
%A 张保澄
%A 赵夔
%J 物理学报
%D 2001
%I 
%X TiO2 thin films were prepared by reactive magnetron sputtering.The influences of O2 partial pressure,substrate temperature and annealing temperature on the structural properties of the films have been studied.In these films anatase and rutile phases were observed and their respective preferred crystallizing conditions were analyzed.In this paper,the morphological characteristic of TiO2 film was also discussed.
%K reactive sputtering
%K TiO2 thin film<br>反应溅射
%K TiO2薄膜
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=D244731E75C3742D&yid=14E7EF987E4155E6&vid=771152D1ADC1C0EB&iid=DF92D298D3FF1E6E&sid=1194166861DF0923&eid=98973A2DBA64FAC9&journal_id=1000-3290&journal_name=物理学报&referenced_num=10&reference_num=13