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物理学报  2004 

Investigation of the model of the discharge properties of the unbalanced magnetron sputtering system
非平衡磁控溅射沉积系统伏安特性模型研究

Keywords: plasma,metallic films/non-magnetism,magnetron sputtering
等离子体
,金属薄膜非磁性,磁控溅射

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Abstract:

The voltage current property of the unbalanced magnetron sputtering (UMS) system has significant influence on the sputtering process and films deposition process. Based on the analysis of the relationship between unbalanced magnetic field and properties of the unbalanced magnetron sputtering system, according to Child law the model of the V I property of the UMS system is set up. Comparisons between the model calculation results and the experimental data indicate that the model correctly expresses the relation between the unbalanced magnetic field and the discharge properties of the UMS system.

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