%0 Journal Article
%T Investigation of the model of the discharge properties of the unbalanced magnetron sputtering system<br>非平衡磁控溅射沉积系统伏安特性模型研究
%A Mu Zong-Xin
%A Li Guo-Qing
%A Che De-Liang
%A Huang Kai-Yu
%A Liu Cui
%A <br>牟宗信
%A 李国卿
%A 车德良
%A 黄开玉
%A 柳 翠
%J 物理学报
%D 2004
%I 
%X The voltage current property of the unbalanced magnetron sputtering (UMS) system has significant influence on the sputtering process and films deposition process. Based on the analysis of the relationship between unbalanced magnetic field and properties of the unbalanced magnetron sputtering system, according to Child law the model of the V I property of the UMS system is set up. Comparisons between the model calculation results and the experimental data indicate that the model correctly expresses the relation between the unbalanced magnetic field and the discharge properties of the UMS system.
%K plasma
%K metallic films/non-magnetism
%K magnetron sputtering<br>等离子体
%K 金属薄膜非磁性
%K 磁控溅射
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=69A7815DAB7275B0&yid=D0E58B75BFD8E51C&vid=8E6AB9C3EBAAE921&iid=B31275AF3241DB2D&sid=3EBE383EEA0A6494&eid=B914830F5B1D1078&journal_id=1000-3290&journal_name=物理学报&referenced_num=4&reference_num=27