EFFECTS OF DEPOSITION TEMPERATURE ON ELECTRICAL PROPERTIES OF HYDROGENATED AMORPHOUS CARBON FILMS
沉积温度对含氢非晶碳膜电学性质的影响

Hydrogenated amorphous carbon films were deposited using ECR plasma with benzene as carbon source at varying substrate temperature. The effects of deposition te mperature on the resistivity and the intensity of electric break down have been investigated. The results show these properties depend on their growth condition s. The experiment results are further investigated using Raman spectra analysis.