%0 Journal Article
%T EFFECTS OF DEPOSITION TEMPERATURE ON ELECTRICAL PROPERTIES OF HYDROGENATED AMORPHOUS CARBON FILMS<br>沉积温度对含氢非晶碳膜电学性质的影响
%A CHENG SHAN-HUA
%A NING ZHAO-YUAN
%A KAN JIAN
%A MA CHUN-LAN
%A YE CHAO
%A <br>程珊华
%A 宁兆元
%A 康健
%A 马春兰
%A 叶超
%J 物理学报
%D 2000
%I 
%X Hydrogenated amorphous carbon films were deposited using ECR plasma with benzene as carbon source at varying substrate temperature. The effects of deposition te mperature on the resistivity and the intensity of electric break down have been investigated. The results show these properties depend on their growth condition s. The experiment results are further investigated using Raman spectra analysis.
%K amorphous carbon film
%K ECR plasma
%K electrical property<br>非晶碳薄膜，
%K ECR等离子体化学气相沉积，直流电阻
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=9377DF7592C4AE88&yid=9806D0D4EAA9BED3&vid=2A3781E88AB1776F&iid=F3090AE9B60B7ED1&sid=E7B46CD86468D9A6&eid=549638E6695045E9&journal_id=1000-3290&journal_name=物理学报&referenced_num=3&reference_num=4