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物理学报  1998 

STUDY ON THE ELECTRON MOBILITY FOR EACH SUBBAND ON THE n-HgCdTe ACCUMULATED LAYER
n-HgCdTe表面积累层中子带电子迁移率的研究

Keywords: 电子迁移率,中子带,汞镉碲器件,表面积累层

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Abstract:

By using quantitative mobility spectrum analysis technique, the temperature-dependent density and mobility for each subband of the accumulated layer on the n-HgCdTe devices have been determined from magnetic-field-dependent Hall and resistivity data.The results agree well with the Shubnikov-de Hass measurements and theoretical calculations.

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