CARBON FILM DEPOSITED BY MASS-SELECTED LOW ENERGY ION BEAM TECHNIQUE AND ION BOMBARDMENT EFFECT
质量分离低能离子束沉积碳膜及离子轰击效应

By mass-selected low energy ion beam deposition, amorphous carbon film was obtained. X-ray diffraction, Raman and Auger electron spectroscopy depth line shape measurements showed that such carbon films contained diamond particles. The main growth mechanism is subsurface implantation. Furthermore, it was indicated in a different way that ion bombardment played a decisive role in bias enhanced nucleation of chemical vapor deposition diamond.