INVESTIGATION ON THERMAL STABILITY OF REACTIVE- SPUTTERING a-Si:H/a-Ge:H SUPERLATTICES
反应溅射a-Si:H/a-Ge:H超晶格的热稳定性

The thermal stability of a-Si:H/a-Ge:H superlattices was studied using LR and XRD spec tra. It was found that the crystallization temperature of superlattices with small layer thickness is higher than that of bulk a-Ge:H. Results are discussed preliminarily.