A KINETIC ANALYSIS OF THE DEPOSITION MASS DISTRI-BUTION IN AN AXIAL-FLOW RF PCVD REACTOR
轴流式射频PCVD沉积质量分布的动力学分析

On the basis of the diagnostics about the axial distribution of plasma electron temperature and electron density in an axial flow RF PCVD reactor by using electrical probe, a model for two-dimension fluid kinetics concerned with major PCVD parameters is proposed. A kinetic analysis about how deposition profiles are influenced by major PCVD parameters is presented by means of the analysis of plasma parameters. The model has been applied to study the deposition process of SnO2 films obtained from a gases mixture of SnCl4 and O2. The theoretical calculation are in good agreement with the experiments of deposition.