%0 Journal Article
%T A KINETIC ANALYSIS OF THE DEPOSITION MASS DISTRI-BUTION IN AN AXIAL-FLOW RF PCVD REACTOR<br>轴流式射频PCVD沉积质量分布的动力学分析
%A LIU DA-MING
%A LIU ZU-LI
%A YAO KAI-LUN
%A LI ZAI-GUANG
%A <br>刘大明
%A 刘祖黎
%A 姚凯伦
%A 李再光
%J 物理学报
%D 1991
%I 
%X On the basis of the diagnostics about the axial distribution of plasma electron temperature and electron density in an axial flow RF PCVD reactor by using electrical probe, a model for two-dimension fluid kinetics concerned with major PCVD parameters is proposed. A kinetic analysis about how deposition profiles are influenced by major PCVD parameters is presented by means of the analysis of plasma parameters. The model has been applied to study the deposition process of SnO2 films obtained from a gases mixture of SnCl4 and O2. The theoretical calculation are in good agreement with the experiments of deposition.
%K 轴流式
%K 射频
%K PCVD
%K 沉积质量
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=A8885257B258EBA5BA85D69F25E414C2&yid=116CB34717B0B183&vid=1371F55DA51B6E64&iid=9CF7A0430CBB2DFD&sid=CAF3E71A6764366D&eid=F3699C8B183A53ED&journal_id=1000-3290&journal_name=物理学报&referenced_num=0&reference_num=3