FABRICATION AND CHARACTERIZATION OF SPUTTERED W/C MULTILAYER MIRROR FOR SOFT X-RAY
W/C超薄多层膜的制备及其结构与光学特性分析

W/C multilayer mirror for 4.47nm had been fabricated by planar magnetron sputtering. Using small angle X-ray, transmission electon microscopy cross-section analysis and 4.47nm absolute reflectivity measurement techniques, the structrure and optical properties of this multilayer had been characterized.