%0 Journal Article
%T FABRICATION AND CHARACTERIZATION OF SPUTTERED W/C MULTILAYER MIRROR FOR SOFT X-RAY<br>W/C超薄多层膜的制备及其结构与光学特性分析
%A SHAO JIAN-DA
%A FAN ZHENG-XIU
%A YIN GONG-JIE
%A YI KUI
%A YUAN LI-XIANG
%A <br>邵建达
%A 范正修
%A 殷功杰
%A 易葵
%A 袁利祥
%J 物理学报
%D 1994
%I 
%X W/C multilayer mirror for 4.47nm had been fabricated by planar magnetron sputtering. Using small angle X-ray, transmission electon microscopy cross-section analysis and 4.47nm absolute reflectivity measurement techniques, the structrure and optical properties of this multilayer had been characterized.
%K 磁控溅射
%K W／C多层模
%K 薄膜
%K 制备
%K 光学特性
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=29DF2CB55EF687E7EFA80DFD4B978260&aid=6041BC4BCD1E662968DA26ED9976C0A0&yid=3EBE383EEA0A6494&vid=BE33CC7147FEFCA4&iid=59906B3B2830C2C5&sid=FFD10F7019FAA9EC&eid=885CEFEC57DA488F&journal_id=1000-3290&journal_name=物理学报&referenced_num=3&reference_num=5