A novel method to enhance the gettering efficiency in p-type Czochralski silicon by a sacrificial porous silicon layer
利用多孔硅层增强P型CZ硅中吸杂效率的一种新方法

A new two-step phosphorous diffusion gettering(TSPDG) process using a sacrificial porous silicon layer(PSL) is proposed.Due to a decrease in high temperature time,the TSPDG(PSL) process weakens the deterioration in performances of PSL,and increases the capability of impurity clusters to dissolve and diffuse to the gettering regions.By means of the TSPDG(PSL) process under conditions of 900℃/60 min + 700℃/30 min,the effective lifetime of minority carriers in solar-grade(SOG) Si is increased to 14.3 times ...