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Modern Physics 2026
单层MoS2生长机理及光电性能的研究
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Abstract:
本文采用盐辅助化学气相沉积法,以MoO3、S为前驱体,NaCl为生长促进剂,在SiO2/Si衬底上成功制备了单层二硫化钼。系统研究了反应物位置、载气流量等工艺参数对MoS2生长形貌的影响,发现当N2流量为150 sccm时,可获得尺寸超过50 μm的大面积单层MoS2三角形岛状结构。通过拉曼光谱、扫描电子显微镜和原子力显微镜对材料质量进行表征,结果表明所制备的MoS2为单层结构,厚度约0.83 nm,但局部存在由衬底残留物或成核缺陷引起的纳米“帐篷”结构,导致局部应变和双层区域的出现。进一步基于单层MoS2构筑了光电器件,器件在532 nm激光照射下表现出优异的光电性能:光暗电流比接近103,响应时间快至微秒级(上升时间12 μs,下降时间85 μs),响应率最高可达63.4 mA/W。研究表明,盐辅助CVD法生长的单层MoS2在高速光电探测领域具有良好应用前景。
In this paper, monolayer molybdenum disulfide was successfully synthesized on SiO2/Si substrates via the salt-assisted chemical vapor deposition (CVD) method, using MoO3 and S as precursors and NaCl as a growth promoter. The effects of process parameters such as reactant position and carrier gas flow rate on the growth morphology of MoS2 were systematically investigated. It was found that large-area triangular island structures of monolayer MoS2 with sizes exceeding 50 μm could be obtained at a N2 flow rate of 150 sccm. The material quality was characterized by Raman spectroscopy, scanning electron microscopy and atomic force microscopy. The results demonstrate that the as-prepared MoS2 exhibits a monolayer structure with a thickness of approximately 0.83 nm. However, local nano-“tent” structures induced by substrate residues or nucleation defects exist, leading to local strain and the formation of bilayer regions. Furthermore, optoelectronic devices were constructed based on the monolayer MoS2, which exhibit excellent photoelectric performance under 532 nm laser irradiation: the photocurrent-to-dark-current ratio is close to 103, the response time is as fast as the microsecond level (rise time 12 μs, decay time 85 μs), and the maximum responsivity reaches up to 63.4 mA/W. This study suggests that monolayer MoS2 grown by the salt-assisted CVD method holds promising application prospects in the field of high-speed photodetection.
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