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硅薄膜及其光学特性研究进展
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Abstract:
本文主要介绍了硅薄膜的分类，及其硅薄膜制备的研究现况及进展。硅是最重要的半导体材料之一，如今在太阳能电池和集成电路领域有着广泛的应用，硅膜可分为非晶硅、多晶硅、单晶硅膜三类。非晶硅薄膜因其特殊的物性、易制备等特点，在大面积太阳能电池、大屏幕LCD、平板电视等领域有着广阔的应用前景，是目前国际上最受关注的领域之一。近年来，随着薄膜制造工艺的进步，氢化微晶硅、多晶硅等已被成功制造出来。该类薄膜具有比非晶硅、单晶硅更好的性能，而且在很低的温度下大面积生长，易于掺杂，且导电性能好，因此在太阳能电池、薄膜晶体管(TFT)等领域有重要的应用前景。
This paper introduces the classification of silicon films, and the current status and progress of re-search on their preparation. Silicon is one of the most important semiconductor materials and today has a wide range of applications in solar cells and integrated circuits. Silicon films can be classified into three categories: amorphous silicon, polycrystalline silicon and monocrystalline silicon films. Amorphous silicon films have broad application prospects in large area solar cells, large screen LCDs, flat panel TVs and other fields due to their special physical properties and easy preparation, and are currently one of the most popular areas of international attention. In recent years, with the advancement of thin film manufacturing process, hydrogenated microcrystalline silicon and poly-crystalline silicon have been successfully manufactured. The thin film has better performance than amorphous silicon, monocrystalline silicon, and it grows in a large area at a very low temperature, is easy to doping, and has good electrical conductivity, so in the solar cell, thin film transistor (TFT) and other fields has important application prospects.
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