Deposition and Structural Characterization of Sn-Se-Te Thin Films

In this study, the effects of Se and Te substitution on structural and morphological properties of SnSeTe (TSeTe) thin films are studied. TSeTe thin films are fabricated by using the physical vapor deposition (PVD). In order to determine the structural and morphological properties of these films, XRD (X-ray diffraction), SEM (Scanning electron microscopy), EDXA (Energy dispersive X-Ray analysis), Raman Analysis, and AFM (Atomic Force Microscopy) measurements are carried out. Then, different post-annealing processes are applied to figure out the heat treatment effects on the thin film propertie