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Material Sciences 2020
区熔法拉制硅单晶中多晶棒化刺工艺探讨
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Abstract:
区熔硅单晶因其高电阻、高少子寿命的优点,成为电力电子器件制造中不可或缺的半导体材料。本文首先对区熔硅单晶生长的机理进行探究,然后得出了解决多晶棒出刺问题的工艺。
The floating zone silicon single crystal becomes an indispensable material because of its advantage in high resistivity and high minority carrier life. This paper discuss the principle of the growth of the single silicon crystal by floating zone, then a process is gained which remove the spine of poly crystal rod.
[1] | 史继祥, 索开南. 气相掺杂区熔硅单晶的掺杂剂量计算方法研究[J]. 新技术运用与研究, 2013(10): 50-53. |
[2] | 王美. 悬浮区熔法生长大直径单晶硅的数值模拟及其热场分析[D]: [硕士学位论文]. 天津: 南开大学, 2014. |
[3] | 沈文杰. 大直径区熔硅单晶生长设备电磁场及温度场的数值模拟与实验研究[D]: [硕士学位论文]. 杭州: 浙江大学, 2013. |