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-  2015 

杂质的正电子亲和能对慢正电子束研究缺陷深度分布的影响 Positron Affinity of Impurities Effect on the Defects Distribution of Slow Positron Beam Measurement

Keywords: 慢正电子束,正电子亲和能,离子注入,辐照损伤

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Abstract:

为了研究杂质的正电子亲和能对正电子技术测量空位型缺陷深度分布的影响,本文利用慢正电子技术研究了不同离子注入Mo样品中产生的缺陷及缺陷的深度分布,所得到的实验结果与SRIM计算模拟结果相比较,慢正电子测量空位型缺陷深度分布范围总是大于SRIM模拟的缺陷分布.慢正电子束测量Cu离子注入的S参数最大值的深度(150 nm)要大于Mo离子注入的深度(125 nm).结果表明,正电子亲和能高的Cu杂质团簇比Mo空位团更容易捕获正电子,且Cu团簇对正电子的捕获会影响到慢正电子束测量表面缺陷深度的结果

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