OALib Journal期刊
ISSN: 2333-9721
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脉冲偏压对矩形平面大弧源离子镀tin膜层性能的影响
Keywords: 无机非金属材料,离子镀,矩形靶
Abstract:
?采用矩形平面大弧源离子镀技术在201奥氏体不锈钢基体表面制备tin硬质薄膜,研究了脉冲偏压对tin膜层的表面形貌、相结构、硬度和耐磨性能的影响.结果表明,随着脉冲偏压的增大,薄膜中大颗粒的数目先增加后减少,这是大颗粒受到离子拖曳力和电场力双重作用的结果.存在一个最佳的脉冲偏压,使得制备出的tin膜层具有较高的i(111)/i(200)比例和较高的耐磨性.脉冲偏压为-300v时制备的tin膜层具有最好的综合性能.
References
[1] | 4w.olbrich,j.fessmann,g.kampschulte,jebberink,im-provedcontroloftincoatingpropertiesusingcathodicarcevaporationwithapulsedbias,surf.coat.tech.,49,258(1991)
|
[2] | 5j.fessmann,w.olbrich,g.kampschulte,etal,cathodicarcdepositionoftinandzr(cn)atlowsubstratetem-peraturesusingapulsedbiasvoltage,mat.sci.eng.a,140,830(1991)
|
[3] | 6a.j.perry,j.r.treglio,a.f.tian,lowtemperaturede-positionoftitaniumnitride,surf.coat.tech.,76-77,815(1995)
|
[4] | 8huangmeidong,dongchuang,sunchao,wenlishi,mechanismofeffectofbiasonmorphologiesoffilmspreparedbyarcionplating,actametallrugicasinica,39(5),510(2003)(黄美东,林国强,董闯,孙超,闻立时,偏压对电弧离子镀薄膜表面形貌的影响机理,金属学报,39(5),510(2003))
|
[5] | 9guohuimei,lingouqiang,shengmingyu,wangdezhen,dongchuang,wenlishi,analysisandcalcu-lationofforceonmacro-particlesinplasmasheath,actametallrugicasinica,40(10),1064(2004)(郭慧梅,林国强,盛明裕,王德真,董闯,闻立时,大颗粒在等离子体鞘层中的受力分析与计算,金属学报,40(10),1064(2004))
|
[6] | 10wangfuzhen,mawencun,applicationsofvaporde-positiontechnology,1stedition,beijing,chinamachinepress,143-153(2006)(王福贞,马文存,气相沉积应用技术,第一版,北京,机械工业出版社,143-153(2006))
|
[7] | 11jiangning,shenyaogen,zhanghanjie,baoshin-ing,influenceofsubstratebiasonpropertiesoftinfilmswithx-rayphotoelectronspectroscopyandatomicforcemicroscopystudies,vacuumscienceandtechnol-ogy,24(6),459(2004)(江宁,沈耀根,张寒洁,鲍世宁,用xps和afm等方法研究氮化钛薄膜的物理化学特性,真空科学与技术学报,24(6),459(2004))
|
[8] | 1baixiuqin,lijian,studyoflowtemperaturedeposi-tionofmagneticsputteringtinfilmsandtheirtribologi-calproperties,lubricationengineering,5,15(2006)(白秀琴,李健,磁控溅射tin薄膜低温沉积技术及其摩擦学性能研究,润滑与密封,5,15(2006))
|
[9] | 2wangshidong,huiwenhua,qishan,xuaiqun,friction-wearbehaviouroftinion-platedcoatingbyhol-lowcathodedeposition,materialsscienceandtechnology,1(3),24(1993)(王世栋,惠文华,祁珊,徐爱群,空心阴极tin镀层的摩擦磨损行为,材料科学与工艺,1(3),24(1993))
|
[10] | 3lijinlong,sunmingren,maxinxin,tangguangze,jinyinyu,compositionandstructureoftinfilmpre-paredbyplasma-basedionimplantation,materialssci-enceandtechnology,15(1),40(2007)(李金龙,孙明仁,马欣新,唐光泽,金银玉,等离子体基离子注入制备tin膜的成分结构,材料科学与工艺,15(1),40(2007))
|
[11] | 7huangmeidong,dongchuang,gongjun,luchunyan,sunchao,huangrongfang,wenlishi,ef-fectofbiasonainthinfilmsbycathodicarcionplating,chinesejournalofmaterialresearch,15(6),675(2001)(黄美东,董闯,宫骏,卢春燕,孙超,黄荣芳,闻立时,偏压对阴极电弧离子镀aln薄膜的影响,材料研究学报,15(6),675(2001))
|
[12] | 12lichengming,zhangyong,caoerya,semanalysisofthemacroparticlesintinand(tizrcr)nfilmsde-positedbymulti-arcionplating,journalofchineseelec-tronmicroscopysociety,19(4),565(2000)(李成明,张勇,曹尔妍,多弧离子镀tin和(tizrcr)n膜中宏观颗粒的sem分析,电子显微学报,19(4),565(2000))
|
[13] | 13t.matsue,t.hanabusa,y.ikeuchi,dependencetoprocessingconditionsofstructureintinfilmsdepositedbyarcionplating,vacuum,74(3-4),647(2004)
|
[14] | 14v.n.zhitomirsky,u.kinrot,b.alterkop,r.l.boxman,s.goldsmith,influnceofgaspressureontheioncurrentanditsdistributioninafilteredvacuumarcdepositionsysterm,surf.coat.tech.,86/87(1-3),263(1996)
|
[15] | 15g.q.yu,b.k.tay,s.p.lau,k.prasad,l.k.pan,j.w.chai,d.lai,effectsofnionenergyontitaniumnitridefilmsdepositedbyionassistedfilteredcathodicvacuumarc,chem.phys.lett.,374(3),264(2003)
|
[16] | 16huangmeidong,sunchao,lingouqiang,dongchuang,wenlishi,mechanicalpropertyoflowtemper-aturedepositedtinfilmbypulsedbiasedarcionplating,actametallrugicasinica,39(5),516(2003)(黄美东,孙超,林国强,董闯,闻立时,脉冲偏压电弧离子低温沉积tin硬质薄膜的力学性能,金属学报,39(5),516(2003))
|
[17] | 17gongxiumin,yeweiping,sunwei,xudaqing,zhuxiaoqing,theeffectofpreferentialorientationintincoatingsonthequalityofthecoatings,materialsforme-chanicalengineering,24(1),20(2000)(宫秀敏,叶卫平,孙伟,许大庆,朱小清,tin涂层中的择优取向及其对涂层性能的影响,机械工程材料,24(1),20(2000))
|
[18] | 18c.a.davis,asimplemodelfortheformationofcompres-sivestressinthinfilmsbyionbombardment,thinsolidfilms,226(1),30(1993)
|
[19] | 19d.r.mckenzie,y.yin,w.d.mcfall,n.h.hoang,theori-entationdependenceofelasticstrainenergyincubiccrys-talsanditsapplicationtopreferredorientationintitaniumnitridesthinfilms,j.phys.:condens.matter,8(32),5883(1996)
|
[20] | 20u.c.oh,j.h.je,effectsofstrainenergyonthepreferredorientationoftinthinfilms,j.appl.phys.,74(3),1692(1993)
|
[21] | 21j.pelleg,l.z.zevin,s.lungo,reactivesputterdepositedtinfilmsonglasssubstrates,thinsolidfilms,197(12),117(1991)
|
[22] | 22zhangmingandhejiawen,calculationofelasticma-trixandx-rayelasticconstantofanisotropicfilmsusingkronermethod,thechinesejournalofnonferrousmet-als,11(2),198(2001)(张铭,何家文,用kroner模型计算取向薄膜的弹性矩阵与x射线弹性常数,中国有色金属学报,11(2),198(2001))
|
[23] | 23s.veprek,plasmainducedandplasmaassistedchemicalvapordeposition,thinsolidfilms,130(12),135(1985)
|
[24] | 24h.ljungcrantz,m.oden,l.hultman,jegreene,j-esundgren,nanoindentationstudiesofsingle-crystal(001)-,(011)-,and(111)-orientedtinlayersonmgo,j.appl.phys.,80(12),6725(1996)
|
[25] | 25huangjiamu,xuchengjun,zhangxingyuan,wangyaping,morphologyandphysicalpropertiesofti-taniumnitridefilmsdepositedbymagnetronsputteringatroomtemperature,vacuumscienceandtechnology,25(4),297(2005)(黄佳木,徐成俊,张兴元,王亚平,室温直流磁控溅射氮化钛薄膜研究,真空科学与技术学报,25(4),297(2005))
|
[26] | 26a.j.perry,adhesionstudiesofion-platedtinonsteel.thinsolidfilms,81(4),357(1981)u
|
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