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自支撑硼掺杂金刚石膜残余应力和微观应力的xrd分析

Keywords: 无机非金属材料,cvd金刚石膜,硼掺杂,xrd,残余应力,微观应力

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Abstract:

?利用xrd(包括sin2?φ法)研究了电子辅助热灯丝化学气相沉积法(ea--hfcvd)生长的自支撑硼掺杂多晶金刚石薄膜的残余应力和微观应力.结果表明,薄膜的残余应力为压应力,随着薄膜制备过程中硼流量的增加,应力值有减小的趋势.薄膜的微观应力随着硼流量的增加,由拉应力转变为压应力然后又转变为拉应力.残余应力和微观应力的变化归因于一定量的硼掺杂导致的多晶膜中晶粒尺寸、晶面取向及孪晶变化的共同作用.

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