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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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负热膨胀zrw_2o_8薄膜的制备和性能
Keywords: 无机非金属材料,钨酸锆,薄膜,磁控溅射
Abstract:
？用交替射频磁控溅射法在石英基片上沉积并退火制备了zrw_2o_8薄膜,测量了薄膜与基片之间的结合力和薄膜厚度,研究了薄膜的负热膨胀特性.结果表明:用磁控溅射方法制备的薄膜为非晶态,表面平滑、呈颗粒状,在1200℃热处理3min后得到立方相zrw_2o_8薄膜,结晶薄膜的颗粒长大,薄膜与基片之间有良好的结合力.立方相zrw_2o_8薄膜在15-200℃热膨胀系数为-24.81×10~(-6)k~(-1),200-700℃热膨胀系数为-4.78×10~(-6)k~(-1),平均热膨胀系数为-10.08×10~(-6)k~(-1).
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