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OALib Journal期刊
ISSN: 2333-9721
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磁场非平衡度对crnx镀层性能的影响
Keywords: 无机非金属材料,crnx镀层,非平衡度,离子轰击
Abstract:
？使用具有不同非平衡度的磁控管直流磁控溅射技术沉积crnx镀层,并用langmuir探针诊断、高斯仪测量、ansys软件模拟等手段进行表征,研究了磁场非平衡度对溅射等离子体的空间分布状态以及crnx镀层的微观结构、硬度及摩擦性能的影响。结果表明:低非平衡度磁控管(k为2.78)将多数离子束缚在靶材表面大约6cm范围内,而对于高非平衡度磁控管(k为6.41)则在此区域没有类似的高密度等离子体存在。随着磁场非平衡度的增大,crnx镀层的厚度递增,物相结构也从cr+cr2n依次向cr+cr2n+crn和cr2n+crn转化,且镀层的平整度和致密性随之明显改善。同时,crnx镀层的硬度随着非平衡度的增大而提高,摩擦系数则随之减小。
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