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OALib Journal期刊
ISSN: 2333-9721
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ito上磁控溅射zno薄膜及其光电性质
Abstract:
？在ito(in2o3:sn)衬底上射频溅射zno薄膜,研究了射频溅射功率对zno薄膜的晶体结构,表面形貌及光学透过率的影响.结果表明,随着射频功率的提高,沿(002)方向生长的zno薄膜的结晶度显著增强,薄膜的表面颗粒略有减小,表面粗糙度由13.13nm降低到5.06nm.在300～400nm波长范围内薄膜的光学透过率随着射频功率的增加而降低.在双层薄膜中空间内建电场的存在有助于光生电子和空穴有效地分离,使zno/ito双层薄膜具有较强的光电响应能力,光电流达14μa.
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